The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 08, 1994
Filed:
Dec. 20, 1991
Applicant:
Inventors:
Takayuki Itakura, Moriguchi, JP;
Youichi Takesawa, Suita, JP;
Assignee:
Mita Industrial Co., Ltd., Osaka, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03G / ;
U.S. Cl.
CPC ...
430 58 ; 430 60 ; 430 65 ;
Abstract
Disclosed is an organic highly photosensitive material used for copying machines based on electrophotographic method. The photosensitive material has a high developing sensitivity even using the same developing agent and the same developing system, and makes it possible to form images having high density and high contrast. The organic highly photosensitive material comprises an aluminum substrate having a surface-treated layer and an organic photosensitive layer formed thereon, wherein the surface-treated layer of the aluminum substrate has an impedance Z that lies within a predetermined range.