The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 01, 1994
Filed:
Jan. 17, 1992
Applicant:
Inventors:
Francis Poingt, Ste Genevieve Des Bois, FR;
Jean-Louis Lievin, Paris, FR;
Elisabeth Gaumont-Goarin, Montrouge, FR;
Assignee:
Alcatel N.V., Amsterdam, NL;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
437228 ; 437229 ;
Abstract
In the method, a protective resist (108) used for lithographic etching is caused to flow plastically under the constraint of its surface tension, thereby increasing its thickness around a projection (106) on which a window (104) is to be formed. The invention is particularly applicable to manufacturing semiconductor lasers.
Poingt, Francis. (1994). Method of localized treatment on a projection, in particular for (U.S. Patent No. 5283209). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5283209
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile