The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 01, 1994

Filed:

Dec. 04, 1992
Applicant:
Inventors:

Michael J Lorsung, Rochester, MN (US);

Connie J Mathison, Pine Island, MN (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
437228 ; 437189 ; 437195 ;
Abstract

The invention relates to a method of making a local structure from an organic mandrel on a substrate at the submicrometer level. The mandrel is formed from an organic layer deposited on the substrate. The mandrel is then removed by exposure to an oxygen plasma environment, thus leaving a cavity. A local structure material is deposited into the cavity and polished to form the local structure. In the preferred method of the invention, an electrically conducting, local interconnect is formed from a polyimide mandrel on a wafer used to make integrated circuits.


Find Patent Forward Citations

Lorsung, Michael. (1994). Method of making a submicrometer local structure using an organic mandrel (U.S. Patent No. 5283208). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5283208

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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