The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 01, 1994
Filed:
Sep. 28, 1992
Applicant:
Inventor:
Wu-Shyong Li, Woodbury, MN (US);
Assignee:
Minnesota Mining and Manufacturing Company, St. Paul, MN (US);
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B / ; B32B / ;
U.S. Cl.
CPC ...
428141 ; 428143 ; 428149 ; 428285 ; 428325 ; 428346 ; 428349 ; 428343 ; 428241 ; 428447 ; 428521 ; 428522 ; 428523 ; 428442 ; 428441 ; 359536 ; 359538 ; 359539 ; 359541 ; 359540 ; 427163 ; 427166 ; 427496 ; 427501 ;
Abstract
Retroreflective appliques comprising a monolayer of retroreflective elements partially embedded in and protruding from the front surface of a binder layer and an optional layer of adhesive on the rear surface of the binder layer for securing the applique to a garment, wherein the binder layer comprises an electron-beam cured polymer selected from the group consisting of chlorosulfonated polyethylenes, ethylene copolymers comprising at least about 70 weight percent of polyethylene, and EPDM polymers.