The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 01, 1994

Filed:

May. 05, 1992
Applicant:
Inventors:

Jack Martin, Brookfield, CT (US);

Ed F Talbot, Hamden, CT (US);

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B01D / ;
U.S. Cl.
CPC ...
422168 ; 422172 ; 55235 ; 55237 ; 55238 ;
Abstract

An apparatus for scrubbing a gas in which a vortical flow of a gas and liquid mixture created by an entrainer is emitted from the entrainer and is introduced into a de-entrainer through a guide/deflector assembly. Particulate is removed from the gas and is picked up by the liquid. The de-entrainer separates the liquid from the gas and delivers the scrubbed gas to an outlet. The guide/deflector assembly guides the vortical liquid/gas flow from the entrainer to the de-entrainer and diverts most of the droplets away from the de-entrainer to significantly reduce the amount of liquid droplets entrained in the gas preparatory to entry into the de-entrainer, significantly reducing the amount of droplets emitted with the scrubbed gas. The vane cages of the entrainer/de-entrainer assemblies are designed so that the height to diameter (H:D) ratio is ##EQU1## to increase the operating range.


Find Patent Forward Citations

Martin, Jack. (1994). Entrainer/de-entrainer apparatus including apparatus for significantly (U.S. Patent No. 5283048). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5283048

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