The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 01, 1994
Filed:
Sep. 15, 1992
Suriyanarayan Dorai, Lockport, NY (US);
Frank L Rawling, Jr, Newark, DE (US);
James A Schultz, Swedesboro, NJ (US);
E. I. Du Pont de Nemours and Company, Wilmington, DE (US);
Abstract
Polyether glycols, especially poly(tetramethylene ether) glycol (PTMEG) having a narrow molecular weight distribution of about 1.90 to 2.07, or dispersity of 1.50 to 1.90, are made by a process wherein the low molecular weight fraction in unit operations using at least one short-path distillation evaporator. In these units, PTMEG is subjected to temperatures in the range of 150.degree.-190.degree.C. with the hold-up time varying between 10-200 seconds. The required vacuum to force the separation of the low molecular weight PTMEG varies between 0.001 mm and 1.0 mbar. PTMEG residue from the distillation unit is also characterized by its low water content and low concentration of oligomeric cyclic ethers.