The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 25, 1994

Filed:

Jul. 31, 1992
Applicant:
Inventors:

J Kelly Lee, Rochester, NY (US);

Robert H Cuffney, Honeoye Falls, NY (US);

Richard A Littlefield, Rochester, NY (US);

William R Markis, Rochester, NY (US);

Assignee:

Eastman Kodak Company, Rochester, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J / ;
U.S. Cl.
CPC ...
250235 ; 358497 ;
Abstract

Beam scanning system includes a rotatable element for receiving a stationary light beam at successive element facets to thereby impart a scanning motion to the light beam so as to scan a beam receiving medium. Deviation in the mechanical or optical performance related to each successive facet are corrected by use of a high-speed beam deflector operated in either a closed loop or open loop servo system. The beam deflector includes a unique piezoelectric plate and reflecting body structure, wherein parallel plates of piezoelectric material are bonded at selected locations to a reflecting body with flexible adhesive. The plates are supported by a platform and operatively connected to a plate driving means to effect motion of the body in a push-pull arrangement with respect to the platform. The resulting structure has a high resonant frequency even though a reflecting body in the form of relatively large glass mirror may be employed.


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