The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 25, 1994
Filed:
Jul. 21, 1992
My D Nguyen Handfield, Shawinigan, CA;
Michel G Drouet, Mt. St. Hilaire, CA;
Hydro Quebec, Montreal, CA;
Abstract
Disclosed is a process for immobilizing ashes by vitrification thereof in a plasma arc reactor, which is very efficient to treat ashes and any other pulverulent residues containing toxic leachable components that may be a source of pollution. The process makes use of a plasma reactor of the falling film type, in which an axial transferred or non-transferred arc melts and treats a load tangentially injected or otherwise blown in a cyclonic manner in a sleeve while this load falls down by gravity along the wall of the sleeve and accumulates at the bottom of the reactor in the form of a liquid bath. The load that is fed into the reactor consists of the ashes exclusively if they contain a sufficient amount of silica to make them self-vitrifying, or of a mixture of ashes with silica or another glass-forming agent. The temperature of the bath of glass that accumulates at the bottom of the reactor is controlled in a very precise and adequate manner to reduce as much as possible the formation of fumes and the risk of evaporation. The glass that is so obtained may be removed in a continuous manner from the bottom of the reactor, or poured out of the same at regular interval.