The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 25, 1994
Filed:
Oct. 30, 1992
Joseph M Wahl, Shirley, MA (US);
Randal W Tustison, Lexington, MA (US);
Thomas Y Wong, Needham, MA (US);
Charles B Willingham, Framingham, MA (US);
Raytheon Company, Lexington, MA (US);
Abstract
A technique for increasing the strength of long wavelength infrared material, such as zinc sulfide and zinc selenide includes diffusing species which are applied to the materials as thin films into the zinc sulfide and zinc selenide material. Portions of the thin film material are thermally diffused to substantial depths of up to 100 microns below the depth of flaws formed in the body using one of two diffusion techniques. One diffusion technique uses hot isostatic pressure and the other uses a heat treatment carried out at or near ambient pressure in an inert atmosphere, such as argon or other suitable inert gas.