The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 18, 1994

Filed:

Oct. 23, 1991
Applicant:
Inventor:

Christopher Lacey, San Diego, CA (US);

Assignee:

Phase Metrics, San Diego, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B / ;
U.S. Cl.
CPC ...
356357 ; 356359 ;
Abstract

The apparatus and method for measuring a small spacing down to contact uses an interferometric fringe intensity calibration to calibrate maximum and minimum intensity of two or more monochromatic or quasi-monochromatic interference patterns caused by a spacing between two articles, one of which is transparent. The intensity calibration is done by measuring maximum and minimum fringe intensity of each color while altering the spacing by at least 1/4 of the wavelength of the light or other electromagnetic radiation being used. The calibration by changing spacing allows the fringe order to be calculated for each wavelength of the radiation being used. This calibration procedure allows the maximum and minimum intensity of the radiation to be known, as well as the fringe order of the interference patterns to be calculated. With the maximum and minimum intensities and the fringe orders known, the spacing is readily calculated from interferometric theory.


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