The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 18, 1994
Filed:
Nov. 06, 1992
Terrence J Jach, Washington, DC (US);
Stephen M Thurgate, Kardinya, AU;
The United States of America as represented by the Secretary of Commerce, Washington, DC (US);
Abstract
A system is disclosed for performing x-ray photoelectron emission analysis which uses a collimated x-ray beam directed to an optically polished sample at a small grazing angle of incidence, a fixed sample/electron spectrometer geometry, and an x-ray detector for detecting x-rays reflected off of the sample. With the system, an enhancement of the x-ray field at layer interfaces in a multilayer sample can take place. The system permits depth profiling of an over layer on a substrate, such as a metal or metal oxide on a metal substrate. The enhancement permits absolute calibration of depth-dependence. The system reduces lineshape distortions due to inelastic electron scattering of exiting photoelectrons and eliminates energy distortions due to changes in the sample position relative to the focal point of the electron spectrometer.