The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 18, 1994
Filed:
Jan. 30, 1992
Applicant:
Inventors:
Cheng-Kung Liu, Norwalk, CT (US);
John C Brewer, Bristol, CT (US);
Assignee:
United States Surgical Corporation, Norwalk, CT (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
D01F / ; D01F / ;
U.S. Cl.
CPC ...
2641 / ; 2642108 ; 26421115 ; 2642356 ; 2642896 ; 2642905 ; 26433119 ; 606228 ;
Abstract
A process for manufacturing polyamide monofilament suture includes the steps of extruding a polyamide resin, stretching the solidified monofilament and annealing the stretched monofilament so that it shrinks to within about 80 to about 97 percent of the length of the monofilament prior to annealing. The polyamide monofilament sutures so produced exhibit reduced energy compared to conventional polyamide monofilament sutures.
Liu, Cheng-Kung. (1994). Process for manufacture of polyamide monofilament suture (U.S. Patent No. 5279783). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5279783
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile