The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 18, 1994
Filed:
Nov. 18, 1991
David M Carson, Newtown, CT (US);
E. I. Du Pont de Nemours and Company, Wilmington, DE (US);
Abstract
A centrifuge rotor is characterized by a portion of the undersurface thereof being removed to define a predetermined number of bosses, each with a sample receiving cavity therein. A relatively thin skirt portion extends between at least one pair of adjacent bosses. The skirt portion has defined thereon a localized region which exhibits a stress therein that is greater than the stress present in any other portion of the rotor when the rotor is operating at the predetermined operating speed. The skirt may have a weight thereon. The weight may be either separate from or formed integrally with the skirt. Additionally or alternatively, a stress riser, in the form of one or a pair of hole(s), notch(es) or groove(s), may be defining on the skirt. Over operation time, the probability that rotor failure will occur only in the localized region of the skirt is enhanced.