The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 11, 1994

Filed:

Sep. 03, 1991
Applicant:
Inventors:

Urs Wegmann, Oberschan, CH;

Albert Koller, Azmoos, CH;

Josef Vogt, Balzers, LI;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D / ; C23C / ; B23K / ;
U.S. Cl.
CPC ...
427566 ; 427597 ; 4272481 ; 21912115 ;
Abstract

The invention relates to a method and an apparatus by means of which a material is vaporized in a treatment chamber by means of an electron beam. Due to controlling the inhomogenity of power distribution over the working area of the beam it becomes possible to prevent local overheating of the target material and thus of a deformation of the target surface. This is realized by oscillating the beam around its working point. The amplitude of the oscillation is, thereby, of almost a few beam diameters and this oscillation is superimposed on the momentarily working position of the beam on the target.


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