The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 11, 1994
Filed:
Apr. 14, 1992
William F Henshaw, Lorton, VA (US);
Other;
Abstract
In a magnetron sputtering device for high rate coating of various substrates with sputtered atoms, the sputtering occurs from the interior cavity wall composed of four individual rectangular plates and condenses onto a substrate passing axially through the cavity. Most of the atoms which do not condense on the substrate redeposit on a wall and are subsequently sputtered resulting in efficient target utilization. A few percent, depending on the length of the cavity, escape out the end and are lost to the deposition process. The magnetic field through the cavity is uniform and relatively constant such that the four rectangular targets evenly erode. The two opposing ends of the cavity are open for substrate movement through the deposition region. The magnetic field is generated by a solenoid and allows adjustment for sputtering of magnetic materials.