The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 21, 1993

Filed:

Dec. 31, 1991
Applicant:
Inventors:

Toshio Taguchi, Hiroshima, JP;

Younosuke Hoshi, Hiroshima, JP;

Minoru Sueda, Hiroshima, JP;

Susumu Kamikawa, Hiroshima, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05B / ;
U.S. Cl.
CPC ...
219 10491 ; 219 1067 ; 219 1079 ; 118724 ; 118726 ;
Abstract

A vacuum deposition apparatus has a slit-like nozzle formed in a receptacle accommodating a vacuum deposition material to effect uniform vacuum deposition of the material in the direction of width of a moving base material. The receptacle is made of graphite. An inductively heated body is disposed at the upper part of the receptacle and is provided with the small slit-like nozzle. The nozzle extends in the direction of width of the moving base material. The vaporized vacuum deposition material passes through the nozzle and is deposited uniformly in the direction of width of the moving base material.


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