The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 21, 1993

Filed:

Aug. 05, 1992
Applicant:
Inventor:

Akira Kamisawa, Kyoto, JP;

Assignee:

Rohm Co., Ltd., Kyoto, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B44C / ; C23F / ;
U.S. Cl.
CPC ...
156635 ; 156643 ; 156656 ; 156667 ; 252 792 ; 252 793 ; 252 794 ;
Abstract

A method for patterning a metal oxide thin film comprising the steps of: (1) preparing a mixture solution containing alkoxide or alkoxyalcoholate and alcohol or alkoxyalcohol, (2) mixing an acid-generating agent with the mixture solution, (3) applying the mixture solution to a substrate to form a thin film and drying the thin film, (4) selectively irradiating the thin film formed on the substrate to accelerate the gelation, (5) removing the non-irradiated thin film, and (6) burning the remaining thin film. According to the present invention, a metal oxide thin film is formed by sol-gel method, and thereto is mixed an acid-generating agent, so that etching by irradiating can be applied to a precursor thin film not sintered. Thanks to this, a metal oxide thin film can be easily patterned with a fine processing.


Find Patent Forward Citations

Loading…