The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 14, 1993
Filed:
Dec. 10, 1992
Applicant:
Inventors:
Edward C Bock, Webster, NY (US);
James J Appel, Brighton, NY (US);
Assignee:
Xerox Corporation, Stamford, CT (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B / ;
U.S. Cl.
CPC ...
359206 ; 359216 ;
Abstract
In an overfilled ROS polygon architecture, stray reflection from facets adjacent the completely filled (illuminated) facet are prevented from affecting the scan line images by aligning the optical axis of the pre-polygon and post-polygon optical components at an optimum angle .phi.' so that the stray light reflections at the photoreceptor occur only at non-image forming scan times (outside the image scan time). The optimum angle .phi.' is expressed by the relationship .phi.'=2(.OMEGA..+-.1/2.theta.) where .OMEGA. is given by the expression 360/X, X being the number of scanning facets, and .theta. being the scanning angle.