The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 14, 1993
Filed:
Apr. 26, 1991
Applicant:
Inventor:
Wolfgang Rosner, Neubiberg, DE;
Assignee:
Siemens Aktiengesellschaft, Munich, DE;
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
437 48 ; 437 47 ; 437 52 ; 437228 ;
Abstract
The method produces an opening in a layered semiconductor structure having a site intended for an opening. A place-saver is produced on the structure from a first material to be selectively etched to the structure under the first material and to a material adjacent the site. A layer of a second material to which the first material is selectively etchable, is produced over the entire surface of the structure having the place-saver. The opening is formed by at least partially removing the layer of the second material above the place-saver, and removing the place-saver by selective etching.