The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 14, 1993
Filed:
Dec. 10, 1992
Applicant:
Inventors:
Allen Page, San Antonio, TX (US);
Stacy W Hall, San Antonio, TX (US);
Assignee:
VLSI Technology, Inc., San Jose, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23F / ; C23F / ;
U.S. Cl.
CPC ...
156640 ; 156643 ; 156646 ; 156656 ; 156664 ; 134-2 ; 134 31 ; 134 33 ;
Abstract
After a metal deposition is patterned using a plasma etch, the metal pattern is sprayed with steam and water. During the spraying the wafer is rotated to ensure proper distribution and removal of the spray. The spray removes chlorine residue from the etch that might otherwise corrode the metal pattern. After the spray, the spin rate is increased to dry the wafer. The net result is a faster and more effective method for chlorine removal from a plasma-etched metal pattern.