The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 07, 1993
Filed:
Oct. 22, 1991
Nageshwer R Bantu, Endicott, NY (US);
Anilkumar C Bhatt, Johnson City, NY (US);
Ashwinkumar C Bhatt, Endicott, NY (US);
Joseph A Kotylo, Binghamton, NY (US);
Gerald W Jones, Johnson City, NY (US);
Robert J Owen, Binghamton, NY (US);
Kostas Papathomas, Endicott, NY (US);
Anaya K Vardya, Endicott, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
Simple, environmentally friendly developers and strippers are disclosed for free radical-initiated, addition polymerizable resists, cationically cured resists and solder masks and Vacrel photoresists. In all cases both the developers and the strippers include gamma butyrolactone, propylene carbonate and benzyl alcohol, optionally also including a minor amount of methanol, ethanol, isopropyl alcohol, propylene glycol monomethylacetate, ethylene glycol monomethyl ether, formamide, nitromethane, propylene oxide, or methyl ethyl ketone, acetone and water.