The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 07, 1993
Filed:
Jan. 17, 1989
Alvin M Marks, Athol, MA (US);
Other;
Abstract
A process for the manufacture of submicron circuits uses a submicron beam writer having multiple beams to Inscribe simultaneously a plurality of metal patterns onto a glass surface having a monoatomic or monomolecular resist. The beams produce a plurality of charged double layers constituting the pattern. Metal is deposited according to the pattern. The pattern may have metal strips with 20 to 100 A gaps coated with different materials having different work functions on opposing gap-faces, forming tunnel junctions acting as diodes. The patterns may be costed with Insulating coatings. The manufacturing equipment, chemistry and processes for manufacturing these sheet products are described. The sheet products may be employed as a light-electric power converter (LEPCON.TM.); or, in reverse with electric power supplied, as a large area laser, (ELCON.TM.) used for 2D or 3D displays, for a high density high speed computer matrix and for a variety of uses.