The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 30, 1993
Filed:
May. 24, 1990
Roger Chatelin, Lisseux/Lozanne, FR;
Louis Gavet, Lyons, FR;
Institue Textile de France, Bagneux, FR;
Abstract
A grafting reaction system comprises an activated polymer and a grafting medium containing a monomer, with the system containing free radicals. The system further comprises 0.1 to 2% by weight of the grafting medium and monomer of a homopolymerization inhibitor compound, the inhibitor compound comprising a compatabilizing function toward the grafting medium which is selected from the group consisting of sulfonic, carboxylic and phenolic groups, and an inhibiting function which acts as a transfer agent for the free radicals, the inhibiting function being an allyl-type unsaturated group. The inhibitor compound has a diffusing capacity through the grafting medium which is greater than its diffusing capacity through the polymer.