The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 23, 1993
Filed:
Dec. 20, 1991
Applicant:
Inventors:
Shiho Wang, Ventura, CA (US);
Satyabrata Raychaudhuri, Agoura, CA (US);
Arnab Sarkar, West Hills, CA (US);
Assignee:
Yazaki Corporation, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
B01J / ; C01B / ;
U.S. Cl.
CPC ...
423338 ; 2523156 ; 501 12 ;
Abstract
An improved sol-gel process for fabricating large, crack-free gel monoliths (e.g., of silica) is described in which a specially-tailored gel microstructure is provided by adjusting the relative concentrations of an alcohol diluent (e.g., ethanol) and/or one or more catalysts (e.g., HCl and HF). Controlled variations in the gel's average pore radius, bulk density, rupture modulus, and elastic modulus over a wide range can be tailored in this fashion. This enables the process to be optimized for the particular application involved.