The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 16, 1993

Filed:

Dec. 20, 1991
Applicant:
Inventors:

Johannes J Cuppen, Eindhoven, NL;

Miha Fuderer, Eindhoven, NL;

Antoon F Mehlkope, Eindhoven, NL;

Michael J Duijvestijn, Eindhoven, NL;

Gerrit H Van Yperen, Eindhoven, NL;

Assignee:

U.S. Philips Corp., New York, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01R / ;
U.S. Cl.
CPC ...
324312 ; 324309 ;
Abstract

In magnetic resonance imaging various error sources lead to deterioration of the image quality. One class of errors is formed by errors which vary only slowly over the time required to sample a data line but vary substantially over the time required to acquire data for the complete magnetic resonance image. These error sources are, for example external magnetic fields, motion due to respiration, drift in amplifiers or drift phenomena in permanent magnets due to temperature influences. It is proposed to utilize mutually intersecting data lines in the Fourier domain so as to estimate these error sources and to use these estimates to correct the data sets obtained before execution of image reconstruction.


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