The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 16, 1993
Filed:
Mar. 26, 1991
Atsuhiro Fujii, Itami, JP;
Mitsubishi Denki Kabushiki Kaisha, Tokyo, JP;
Abstract
A method of treating a substrate with substantially equal flow rates of treatment gases in a treatment chamber containing the substrate. Because the times during which the treatment gases pass through pipes are controlled, even when the flow rates of the treatment gases differ appreciably, the impurity concentration in a film near the interface between the substrate and the film reaches a desired concentration. Also, when the times during which the treatment gases pass through the pipes are short, the treatment gases are unlikely to adhere to the walls of the pipes. It is thus possible to reduce the frequency of dummy runs.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile