The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 16, 1993
Filed:
Apr. 06, 1992
Applicant:
Inventors:
Svetlana A Krapivina, St. Petersburg, SU;
Georgy Z Paskalov, St. Petersburg, SU;
Alexander K Filippov, St. Petersburg, SU;
Assignee:
Plasma Plus, Los Angeles, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B05D / ; B05D / ; B05D / ; B05D / ;
U.S. Cl.
CPC ...
427491 ; 427569 ; 4272551 ; 4272552 ; 4272556 ; 427391 ; 427536 ; 427488 ;
Abstract
Archival materials including paper manuscripts are preserved by a thin protective polymer film applied to the surface of the item by plasma polymerization of an organic monomer gas in a high frequency glow discharge. The polymer film protects the item against humidity and prevents widening of stroke lines due to ink spreading on the document. Microorganism growth is stopped by pretreatment of the document in a monoatomic gas plasma.
Quick Actions:
Krapivina, Svetlana. (1993). Gas plasma treatment for archival preservation of manuscripts and the (U.S. Patent No. 5262208). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5262208
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile