The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 16, 1993

Filed:

Sep. 29, 1992
Applicant:
Inventors:

Leo E Hakka, Dollard Des Ormeaux, CA;

Paul J Parisi, Saint Lambert, CA;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C01B / ; C01B / ;
U.S. Cl.
CPC ...
4232427 ; 42324301 ;
Abstract

Processes for the removal of sulfur dioxide from gas streams, e.g., stack gases, are disclosed wherein the absorption occurs in the presence of a diamine. The first amine group, i.e., stronger amine group, of the diamine is in salt form, having sulfite anions associated therewith, and absorbs by a sulfite/bisulfite absorption mechanism. The second amine groups absorbs sulfur dioxide in free base form. The sulfite salt on the first amine group is maintained by controlling the level of heat stable salts in the absorbent. Both the first and second amine groups can be conveniently regenerated together, e.g., by steam stripping.


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