The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 09, 1993
Filed:
Apr. 20, 1992
Applicant:
Inventor:
Xingwu Wang, Alfred, NY (US);
Assignee:
Alfred University, Alfred, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D / ; B05D / ;
U.S. Cl.
CPC ...
427576 ; 427569 ; 427565 ; 427226 ; 427421 ; 429 30 ;
Abstract
An atmospheric process for the production of a coating or film for electrochemical cells is disclosed. In the first step of this process, an aerosol mist containing reactants necessary to form the desired coating or film is provided. Thereafter, the mist is subjected to radio-frequency radiation while in the plasma region. Thereafter, the vaporized mixture is then deposited onto a substrate.