The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 02, 1993
Filed:
Oct. 11, 1991
Hidetoshi Shinada, Kanagawa, JP;
Fuji Photo Film Co., Ltd., Kanagawa, JP;
Abstract
A method and apparatus for scanning and exposing in which m laser beams which are arranged in an array so that part of a adjacent laser beams overlap on the photosensitive surface, are main-scanned in a direction intersecting the line along which the laser beams are arranged, while being sub-scanned in the direction in which they are arrayed, to carry out a two-dimensional exposure. The power of at least one of the mth laser beam for the Nth main scanning and the first laser beam for the (N+1)th main scanning is changed, or the distance between the mth laser beam for the Nth main scanning and the first laser beam for the (N+1)th main scanning is changed, to correct density unevenness at the overlapping portion of the mth and the first laser beams.