The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 02, 1993
Filed:
Dec. 23, 1991
Nariyuki Hayashi, Sodegaura, JP;
Toshimichi Ito, Sodegaura, JP;
Idemitsu Petrochemical Co., Ltd., Tokyo, JP;
Abstract
The present invention concerns a method of producing a diamond thin film. A plasma-activated gas, obtained by exciting a starting material containing a carbon source gas, is brought into contact with a surface of a substrate, on which a diamond thin film is to be formed under the presence of an auxiliary member placed adjacent to a protruded portion present at the surface of the substrate. The diamond thin film is thereby formed on the substrate. An apparatus for producing a diamond thin film by means of a microwave plasma method has an auxiliary member placed adjacent to a protruded portion present at the surface of the substrate on which the diamond thin film is to be formed.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile