The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 02, 1993
Filed:
Sep. 06, 1991
Donald J Wagner, Venetia, PA (US);
Gary Reed, Clairton, PA (US);
Cycam, Inc., Houston, PA (US);
Tech Met, Inc., Glassport, PA (US);
Abstract
An attachment surface for increasing adhesion between two objects or materials and a method for creating such a surface is disclosed. A substrate, including articles such as particularly an implantable device and high performance aircraft parts, is provided with a random irregular pattern formed through a repetitive masking and chemical milling process. Surface material is removed from the substrate without stress on the adjoining material and the process provides fully dimensional fillet radii at the base of the surface irregularities. This irregular surface is adapted to receive the adjacent material to be joined thereto, such as the ingrowth of bone material, and to provide a strong anchor for that material. The unitary nature of the substrate and surface features provides a strong anchoring surface with is resistant to cracking or breaking. The surface is prepared through an etching process which utilizes the random application of a maskant and subsequent etching of the metallic substrate in areas unprotected by the maskant. This chemical etching process is repeated a number of times as necessitated by the nature of the irregularities required in the surface. The etching characteristics are controlled by the time, temperature and number of repetitions utilized in the etching process.