The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 26, 1993
Filed:
Oct. 03, 1991
Applicant:
Inventor:
Marlan O Scully, Irving, TX (US);
Assignee:
Biolight, Inc., Tucson, AZ (US);
Primary Examiner:
Int. Cl.
CPC ...
B23K / ;
U.S. Cl.
CPC ...
21912168 ; 21912169 ;
Abstract
Method and apparatus for increasing the index of refraction, n, by several orders of magnitude. Pumping and probing radiation excite the various atomic levels of a material, and establish coherence between such levels. Index of refraction can thereby be increased while, concomitantly, absorbence of the material is minimized.
Quick Actions:
Scully, Marlan. (1993). Apparatus and method for making and using high index of refraction (U.S. Patent No. 5256849). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5256849
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile