The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 26, 1993
Filed:
Aug. 12, 1991
Applicant:
Inventors:
Tsuyoshi Morita, Chiba, JP;
Kimikazu Nakamura, Sakura, JP;
Assignee:
Dainippon Ink and Chemicals, Inc., Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C08F / ;
U.S. Cl.
CPC ...
525 52 ; 525 53 ; 525 54 ;
Abstract
An impact resistant styrene resin is prepared by the continuous bulk polymerization of a styrene monomer in the presence of a second component having a 5 wt % styrene solution viscosity which may be polybutadiene, styrene-butadiene copolymerization rubber, or mixtures thereof. Preliminary polymerization is carried out in a reactor having a dynamic mixing structure and which is integrated between and connected to the material feed line and the initial-stage polymerization line.