The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 26, 1993

Filed:

Feb. 14, 1992
Applicant:
Inventors:

Subhendu Guha, Troy, MI (US);

Chi C Yang, Troy, MI (US);

Arindam Banerjee, Madison Heights, MI (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L / ; H01L / ;
U.S. Cl.
CPC ...
437-4 ; 437101 ; 136258 ; 257458 ; 427 74 ; 427575 ; 427578 ;
Abstract

A method for manufacturing thin film, photovoltaic devices of the type having an intrinsic semiconductor layer disposed between two oppositely charged doped, semiconductor layers. A buffer layer of intrinsic semiconductor material is RF deposited at the junction between a microwave deposited, base intrinsic layer and a layer of doped material. The cell produced by the method of the present invention has enhanced performance characteristics over cells having microwave deposited intrinsic layers with no barrier layers.


Find Patent Forward Citations

Guha, Subhendu. (1993). Method of making pin junction semiconductor device with rf deposited (U.S. Patent No. 5256576). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5256576

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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