The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 26, 1993
Filed:
Jan. 22, 1993
Applicant:
Inventor:
Tetsuya Kitamura, Gifu, JP;
Assignee:
Brother Kogyo Kabushiki Kaisha, Nagoya, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B44C / ; C23F / ; C03C / ;
U.S. Cl.
CPC ...
156643 ; 156644 ; 156651 ; 156656 ; 156657 ; 156645 ; 156901 ;
Abstract
In an aperture electrode and a method for manufacturing the same, two metal layers are formed on both surfaces of a thin ceramic insulating substrate by a thin film forming process such as sputtering, and then plural control electrodes are formed on one surface of the substrate by patterning the metal layer on the surface with photoetching, thereby forming a basic body of the aperture electrode. Thereafter, an aperture for passing toners therethrough is formed substantially at the center of each control electrode by drilling the basic body or irradiating laser beam of an excimer laser source to the basic body.