The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 19, 1993
Filed:
Oct. 23, 1992
Toshinobu Suzuki, Tokyo, JP;
Olympus Optical Co., Ltd., Tokyo, JP;
Abstract
The invention provides an ultra-wide field eyepiece for microscopes, in which such off-axial aberrations as the curvature of field, astigmatism and coma are well-enough corrected at a field number as large, as 26.5, and in which the flatness of the image surface is degraded even when the entrance pupil position varies, and which comprises, in order from the entrance side, a first lens unit G1 of negative refracting power, a second lens unit G2 of positive refracting power, a third lens unit G3 of negative refracting power, a fourth lens unit G4 of positive refracting power and a fifth lens unit G5 of positive refracting power with the surface having a stronger curvature facing the entrance side, said third to fifth lens units being located in the rear of an intermediate image plane.