The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 19, 1993
Filed:
Oct. 01, 1991
Glenn T Pearce, Fairport, NY (US);
Elizabeth V Patton, Pittsford, NY (US);
Michael R Roberts, Rochester, NY (US);
Ignazio S Ponticello, Pittsford, NY (US);
George Villard, Rochester, NY (US);
Susan C Gross, deceased, late of Rochester, NY (US);
Marjorie M Datskow, executrix, Lafayett Hill, PA (US);
Eastman Kodak Company, Rochester, NY (US);
Abstract
This invention provides a photographic element containing a polymer layer which reflects a development inhibitor or its precursor released from a DIR compound thereby retarding the diffusion of the development inhibitor to another layer. The polymers used in the barrier layer contain from about 1.times.10.sup.-5 to about 4.times.10.sup.-3 ion forming functional groups. The preferred polymers comprise repeating units of the formula --(A).sub.m -(B).sub.n -- with A derived from a hydrophobic monomer and B derived from an ionic hydrophilic monomer with the more preferred monomers being acrylates, methacrylates, acrylamides and methacrylamides. The invention also provides a method of processing a photographic element containing such a barrier layer.