The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 19, 1993
Filed:
Sep. 17, 1991
Applicant:
Inventor:
Hirotsugu Wada, Tokyo, JP;
Assignee:
Kabushiki Kaisha Toshiba, Kawasaki, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F / ;
U.S. Cl.
CPC ...
430-5 ; 430311 ; 2504922 ; 2503 / ; 250398 ;
Abstract
A reflection mask has a reflection pattern which is formed on a required portion of the surface of a substrate and on which a voltage sufficient to reflect incident electrically charged beams is applied, and a non-reflection pattern which is formed on the other portion of surface of the substrate and on which a voltage sufficient to emit the electrically charged beams to the non-reflection pattern is applied.