The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 12, 1993
Filed:
Feb. 11, 1991
Toshio Suzuki, Iruma, JP;
Hitachi, Ltd., Tokyo, JP;
Abstract
A method and apparatus for converting design pattern data for a semiconductor integrated circuit device to an exposure data for use in an exposure apparatus. The pattern data includes a repetition data section corresponding to the repetition section and defining one or more repetitive pattern segments for the unit cells with an overlap between adjacent ones of repetitive pattern segments and a non-repetition data section corresponding to the non-repetition section. Repetition information specifying the repetitive pattern segment is first produced from the design pattern data, and a pattern segment repetition frame is determined on the basis of the repetition information. The pattern segment repetition frame defines a unit region selected from the repetitive pattern segment. A repetitive arrangement of the unit region without any overlap is equivalent to at least a portion of the repetition section. Data for one of the unit cells and those of unit cells which are adjacent the one unit cell are selected and developed on the basis of the repetition information and are pattern-processed to produce processed repetitive pattern segment data and that portion of the processed repetitive pattern segment data which lies within the pattern segment repetition frame is extracted to form a fundamental pattern segment data. The fundamental pattern segment data is repetitively used for drawing the repetition section.