The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 12, 1993
Filed:
Oct. 22, 1990
Applicant:
Inventors:
Gijsbertus Bouwhuis, Eindhoven, NL;
Josephus J Braat, Eindhoven, NL;
Assignee:
U.S. Philips Corp., New York, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B / ;
U.S. Cl.
CPC ...
356351 ; 356359 ;
Abstract
A device for detecting a centering error of a rotationally symmetrical surface (0.sub.1, 0.sub.2) of an object (0) with respect to a rotational axis (AR) about which axis the object is rotated for the purpose of the centering error detection is described. Two beams (b.sub.1, b.sub.2 ; b.sub.3, b.sub.4) at angles of approximately 90.degree. are directed onto the object and the variation in the phase difference caused by the centering error (.epsilon.) between the two beams (b.sub.1, b.sub.2 ; b.sub.3, b.sub.4) reflected by the surface is determined.