The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 12, 1993
Filed:
Jan. 27, 1992
Applicant:
Inventor:
William V Schempp, Tucson, AZ (US);
Assignee:
Photometrics Ltd., Tucson, AZ (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
257433 ; 257698 ; 257783 ;
Abstract
Large area semiconductor wafers such as CCDs typically have a non-flat profile. A vacuum chuck is used to generate a vacuum under the chip to reduce the curvature to conform to the flat profile of the substrate surface through which the vacuum is generated. Other than flat final profiles are useful also.
Quick Actions:
Schempp, William. (1993). Apparatus for contouring a semiconductor, light responsive array with a (U.S. Patent No. 5252850). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5252850
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile