The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 12, 1993

Filed:

Nov. 04, 1992
Applicant:
Inventors:

Allen K Tsaur, Fairport, NY (US);

Mamie Kam-Ng, Fairport, NY (US);

Sang H Kim, Pittsford, NY (US);

Assignee:

Eastman Kodak Company, Rochester, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C / ;
U.S. Cl.
CPC ...
430569 ; 430567 ; 430637 ;
Abstract

A process is disclosed of accelerating the preparation of a photographic emulsion containing tabular silver halide grains exhibiting a reduced degree of total grain dispersity. A dispersing medium is provided containing bromide ions, and a population of silver halide grain nuclei containing parallel twin planes is formed in the dispersing medium. A portion of the grain nuclei are ripened out, and then the silver halide grain nuclei containing parallel twin planes remaining are grown to form tabular silver halide grains. A polyalkylene oxide containing both hydrophilic and lipophilic block units is selected from among those known to be capable of reducing total grain dispersity when present during nucleation. However, in this process precipitation is accelerated while maintaining low dispersity of the total grain population by forming twin planes in the grain nuclei within the pAg and temperature boundaries of Curve A in FIG. 1 and by delaying introduction of the polyalkylene oxide block copolymer surfactant until after the silver halide nuclei containing twin planes have been formed.


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