The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 05, 1993
Filed:
Nov. 13, 1991
Minoru Yakubo, Kawaguchi, JP;
Ryoichi Kato, Yokohama, JP;
Fuji Photo Film Co., Ltd., Kanagawa, JP;
Abstract
The improved slit scanning exposure apparatus has a variable slit assembly that is provided in proximity with the exposing zone and which is composed of two slit plates movable independently of each other in synchronism with the scanning speed. The apparatus may additionally have a color filter that can be inserted into the optical path of reflected light from the image on a document in the scanning direction. The apparatus is capable of preventing flare from being admitted through an exposure slit to a light-sensitive material on the exposure position when it is being exposed from light reflected from the document image. In addition, the apparatus enables more than one document image to be edited into a single image and permits the color filter to be inserted into the optical path of reflected light without causing unevenness in colors.