The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 05, 1993
Filed:
Aug. 10, 1992
Toshiyuki Suzuki, Kanagawa, JP;
Katsuyoshi Sasagawa, Kanagawa, JP;
Masao Imai, Kanagawa, JP;
Yoshinobu Kanemura, Kanagawa, JP;
Mitsui Toatsu Chemicals, Inc., Tokyo, JP;
Abstract
A novel polymerizable monomer represented by the formula (I) useful as a raw material for the high surface hardness transparent resin. ##STR1## wherein R is an aliphatic residue having or not having an oxygen atom, an alicyclic ring, a heterocyclic ring or an aromatic ring, or an alicyclic residue, l is 0 or 1, each of i and j is an integer of 1 or more, and when l=0, i=j=1, when l=1, (i+j) is 4 or less, when j=1, X is oxygen or sulfur, when j.gtoreq.2, all X's are oxygen or sulfur, or one X is oxygen and the other X's are sulfur, or one X is sulfur and the other X's are oxygen. The high surface hardness transparent resin comprises a crosslinked polymer prepared by copolymerizing a monomer (A) represented by the formula (I) as above and a monomer (B) containing one or more functional groups of at least one kind selected from the group consisting of CH.sub.2 .dbd.CH--C(O)--O--, CH.sub.2 .dbd.C(CH.sub.3)--C(O)--O-- and ##STR2##