The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 28, 1993
Filed:
Apr. 14, 1992
Shozo Horisawa, Chiba, JP;
Hiroyuki Mita, Kanagawa, JP;
Sony Corporation, Tokyo, JP;
Abstract
A high frequency signal processing apparatus having signal line patterns formed on the upper surface of a dielectric substrate has a bias line pattern that extends from each of the signal line patterns. The bias line pattern has a first portion formed on the upper surface of the dielectric substrate, a second portion formed on the lower surface of the dielectric substrate, and a conductor extending through the dielectric substrate for providing an electrical connection between the first and second portions of the bias line pattern. A trap pattern is formed on the lower surface of the dielectric substrate and is connected to the second portion of the bias line pattern at a position spaced a predetermined distance away from the corresponding one of the signal line patterns. The predetermined distance is substantially equal to an odd number multiplied by T.multidot..lambda./4 where T and .lambda. are the periodicity and wave-length of the high frequency signal to be processed. A grounded pattern is also formed on the first surface of the dielectric substrate.