The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 28, 1993

Filed:

Dec. 26, 1990
Applicant:
Inventors:

Yoshikatsu Satake, Iwaki, JP;

Yoshiyuki Inaguma, Iwaki, JP;

Shinji Yamamoto, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C08L / ;
U.S. Cl.
CPC ...
525537 ; 528150 ;
Abstract

Disclosed herein are a poly(arylene thioether) block copolymer alternately comprising (A) at least one poly(arylene thioetherketoneketone) block having predominant recurring units of the formula ##STR1## and (B) at least one poly(arylene thioether) block having predominant recurring units of the formula ##STR2## (a) the ratio of the total amount of the poly(arylene thioether) block (B) to the total amount of the poly(arylene thioetherketone) block (A) being within a range of 0.1-9 by weight, (B) the weight average molecular weight of the poly(arylene thioether) block (B) being at least 1,000, and (c) said block copolymer having a melt viscosity of 2-100,000 poises as measured at 380.degree. C. and a shear rate of 1,200/sec as well as a production process of the block copolymer.


Find Patent Forward Citations

Satake, Yoshikatsu. (1993). High-heat-resistant, crystalline block copolymers and production process (U.S. Patent No. 5248743). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5248743

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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