The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 21, 1993
Filed:
Jul. 24, 1989
Applicant:
Inventors:
Assignee:
Rohm GmbH Chemische Fabrik, Darmstadt, DE;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02F / ; G11C / ; C09K / ;
U.S. Cl.
CPC ...
359 76 ; 359 78 ; 25229901 ; 365108 ; 428-1 ;
Abstract
A process for producing thin, anisotropic layers composed of liquid crystalline substances, the liquid crystalline substances being applied in a thin layer to one side of a support having a surface prestructured in such a way that the structure is given a preferred direction which determines orientation of the liquid crystalline substance and data storage devices produced.
Omeis, Juergen. (1993). Process for producing anisotropic liquid crystal layers on a substrate (U.S. Patent No. 5247377). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5247377
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