The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 21, 1993
Filed:
Dec. 30, 1991
Larry D Mitcham, Temple, TX (US);
William E Nelson, Dallas, TX (US);
Texas Instruments Incorporated, Dallas, TX (US);
Abstract
A stereolithographic apparatus is disclosed comprising a vat, a working surface in the vat, an elevating mechanism for controlling the level of liquid within the vat relative to the working surface, an illumination source for emitting radiation, and an area array deformable mirror device. The illumination source emits radiation which is operable to harden a stereolithographic liquid, while the deformable mirror device is operable to reflect the incident radiation onto the surface of the liquid. The deformable mirror device can harden an entire lamina of liquid in one brief exposure interval increasing throughout without sacrificing resolution.