The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 21, 1993
Filed:
Oct. 19, 1988
Samuel Schalkowsky, Chevy Chase, MD (US);
Spiral System Instruments, Inc., Bethesda, MD (US);
Abstract
A method for determining an interacting culture medium concentration IAC of a growth-affecting substance in a volume of the culture medium related to growth of a microbial population deposited on a surface of the culture medium in accordance with the invention includes the steps of depositing the growth-affecting substance at a selected stock concentration SC in a programmed deposition on the surface of the culture medium such that the volume of the stock concentration at any deposited location on the surface of the culture medium is determinable; determining a transformation function TF which accounts for movement of the deposited growth-affecting substance through the culture medium; and calculating IAC as a function of SC and TF.